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although the actual wafer diameter and/or thickness may differ due to 3D stacking requirements and/or the effects of prior processing steps
7 The alternative measurement process in this Guide is suitable for use in materials acceptance and process control
semiconductor processes as reflected in a number of existing standards
This Guide applies to UPW-system final filters and other UPW distribution filters intended for use in semiconductor manufacturing tools and ancillary equipment
C06000 - SEMI C60 - Specification for Nitrous Oxide StdVol-3D-IC although the actual wafer diameterThis Standard was technically approved by the Gases Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on December 8, 2016. Available at www. semiviews. org and www. semi. org in March 2017; originally published March 2005; previously published February 2011. The purpose of this Document is to provide a series of specifications for different grades of nitrous oxide (N2O) that are used in