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This Standard defines the common mask data format specifications based on OASIS for mask tools
it is an established method in the semiconductor industry for analyzing and qualifying poly-silicon (poly-Si)
This Practice can also be used to compare the relative costs of a single instrument under different operating conditions
org in April 2014
E09100 - SEMI E91 - プローバ独自の装置モデル（PSEM）に関する仕様 StdPbc-0123 This Standard defines the commonglobal Information & Control Committee200994global Audits and Reviews Subcommittee200910www. semi. org200911CD ROM1999920006 PSEMPSEMSEMI E30GEM Referenced SEMI Standards SEMI E5 SEMI Equipment Communications Standard 2 Message Content (SECS II) SEMI E30 Generic Model for Communications and Control of SEMI Equipment (GEM) SEMI M20 Specification for Establishing a Wafer Coordinate System SEMI M21 Specification for Assigning Addresses to Rectangular