M07900 - SEMI M79 - 太陽電池用円盤状100 mm鏡面研磨単結晶ゲルマニウムウェーハの仕様 Revision:SEMI M79-0211 - Superseded Existing international standards use full

Existing international standards use full screen sequential test patterns that are not suitable for modern FPD systems that dynamically adjust gray levels based on image contents

slip) can be quantified in terms of the percent defective (or percent useful) area on the wafer surface

but these test methods may also be used to map regions of different conductivity type on the surfaces of inhomogeneous specimens

This Specification is part of a suite of Standards that specify the implementation of SEMI Standards for the Sensor/Actuator Network

M07900 - SEMI M79 - 太陽電池用円盤状100 mm鏡面研磨単結晶ゲルマニウムウェーハの仕様 Revision:SEMI M79-0211 - Superseded Existing international standards use fullglobal Compound Semiconductor Materials Committee20101221global Audits and Reviews Subcommittee20112www. semiviews. org www. semi. org 100 mm Referenced SEMI Standards SEMI M1 Specification for Polished Single Crystal Silicon Wafers SEMI MF26 Test Methods for Determining the Orientation of a Semiconductive Single Crystal SEMI MF43 Test Methods for Resistivity of Semiconductor Materials SEMI MF154 Guide for Identification of Structures and Contaminants